发明授权
- 专利标题: Semiconductor chip and method for fabricating the same
- 专利标题(中): 半导体芯片及其制造方法
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申请号: US13006104申请日: 2011-01-13
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公开(公告)号: US08592999B2公开(公告)日: 2013-11-26
- 发明人: Mathias Vaupel
- 申请人: Mathias Vaupel
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: H01L23/29
- IPC分类号: H01L23/29
摘要:
A semiconductor chip includes a first main face and a second main face opposed to the first main face. Side faces connect the first and second main faces. The side faces are at least partially covered with an anti-EBO compound and/or a surface energy reducing compound.
公开/授权文献
- US20120181710A1 Semiconductor Chip and Method for Fabricating the Same 公开/授权日:2012-07-19
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