发明授权
- 专利标题: Application controller
- 专利标题(中): 应用控制器
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申请号: US12278919申请日: 2007-02-06
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公开(公告)号: US08596217B2公开(公告)日: 2013-12-03
- 发明人: Peter Kipfer , Christian Betschon , Bernd Walser
- 申请人: Peter Kipfer , Christian Betschon , Bernd Walser
- 申请人地址: CH Heerbrugg
- 专利权人: Leica Geosystems AG
- 当前专利权人: Leica Geosystems AG
- 当前专利权人地址: CH Heerbrugg
- 代理机构: Maschoff Brennan
- 优先权: EP06101449 20060209
- 国际申请: PCT/EP2007/000994 WO 20070206
- 国际公布: WO2007/090604 WO 20070816
- 主分类号: B05C11/00
- IPC分类号: B05C11/00 ; B05B9/06 ; E01C23/09 ; A01G25/09
摘要:
An application controller for an application unit, for marking substances comprises a radiation sensor, by means of which the relative position of the application unit relative to a reference plane may be determined. The relative position of the application unit can be determined by means for recording the orientation of the application unit controller relative to the reference plane from the association of position with orientation information, such that control instructions, in particular for positional correction may be generated by the application unit controller. The position of the application unit can be adjusted by an actuator device according to the control instructions.
公开/授权文献
- US20090010712A1 APPLICATION CONTROLLER 公开/授权日:2009-01-08
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