发明授权
- 专利标题： Three-dimensional direct-write lithography
- 专利标题（中）： 三维直写光刻技术
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申请号： US11993015申请日： 2006-06-16
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公开(公告)号： US08597871B2公开(公告)日： 2013-12-03
- 发明人: Robert R. McLeod
- 申请人： Robert R. McLeod
- 申请人地址： US CO Denver
- 专利权人： The Regents of the University of Colorado
- 当前专利权人： The Regents of the University of Colorado
- 当前专利权人地址： US CO Denver
- 代理机构： Perkins Coie LLP
- 国际申请： PCT/US2006/023520 WO 20060616
- 国际公布： WO2006/138587 WO 20061228
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02B6/12 ; G02B21/18
摘要：
A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.
公开/授权文献
- US20090218519A1 Three-Dimensional Direct-Write Lithography 公开/授权日：2009-09-03
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