发明授权
- 专利标题: Quantum dot photovoltaic device and manufacturing method thereof
- 专利标题(中): 量子点光电器件及其制造方法
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申请号: US13061297申请日: 2009-08-28
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公开(公告)号: US08603849B2公开(公告)日: 2013-12-10
- 发明人: Kyung Joong Kim , Woo Lee , Yong Sung Kim , Young Heon Kim , Seung hui Hong , Wan Soo Yun , Sang Woo Kang
- 申请人: Kyung Joong Kim , Woo Lee , Yong Sung Kim , Young Heon Kim , Seung hui Hong , Wan Soo Yun , Sang Woo Kang
- 申请人地址: KR Daejeon
- 专利权人: Korea Research Institute of Standards and Science
- 当前专利权人: Korea Research Institute of Standards and Science
- 当前专利权人地址: KR Daejeon
- 代理机构: The Webb Law Firm
- 优先权: KR10-2008-0084695 20080828
- 国际申请: PCT/KR2009/004852 WO 20090828
- 国际公布: WO2010/024629 WO 20100304
- 主分类号: H01L31/0264
- IPC分类号: H01L31/0264
摘要:
The present invention provides a semiconductor based photovoltaic device and a manufacturing method thereof. The semiconductor based photovoltaic device is able to absorb light with a wide band wavelength, and has high photoelectric conversion efficiency since it has high electron-hole pair separation efficiency. More specifically, the method for manufacturing the photovoltaic device comprises the steps of: a) forming a thin semiconductor quantum dot film on a p or n-type semiconductor substrate, wherein the thin semiconductor quantum dot film includes semiconductor quantum dots inside a medium at which the same type of impurities as the semiconductor substrate are doped; b) forming a pore array through partial etching, wherein the pore array penetrates the thin semiconductor quantum dot film; c) depositing a semiconductor in which complementary impurities to the semiconductor substrate are doped on the thin semiconductor quantum dot film at which the pore array is formed; and d) forming sequentially a transparent conductive film and an upper electrode on the semiconductor in which the complementary impurities are doped and forming a lower electrode at a lower portion of the semiconductor substrate.
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