发明授权
- 专利标题： Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell
- 专利标题（中）： 评估太阳能电池抗反射涂层中基体清洁效果和针孔数量的方法
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申请号： US13604230申请日： 2012-09-05
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公开(公告)号： US08604337B2公开(公告)日： 2013-12-10
- 发明人: John M. Cotte , Laura L. Kosbar , Deborah A. Neumayer , Xiaoyan Shao
- 申请人： John M. Cotte , Laura L. Kosbar , Deborah A. Neumayer , Xiaoyan Shao
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Scully, Scott, Murphy & Presser, P.C.
- 代理商 Louis J. Percello, Esq.
- 主分类号： H01L31/0236
- IPC分类号： H01L31/0236
摘要：
A method to determine the cleanness of a semiconductor substrate and the quantity/density of pin holes that may exist within a patterned antireflective coating (ARC) is provided. Electroplating is employed to monitor the changes in the porosity of the ARC caused by the pin holes during solar cell manufacturing. In particular, electroplating a metal or metal alloy to form a metallic grid on an exposed front side surface of a substrate also fills the pin holes. The quantity/density of metallic filled pin holes (and hence the number of pin holes) in the patterned ARC can then be determined.
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