Invention Grant
US08605255B2 Imaging optical system and projection exposure system including the same
有权
成像光学系统和投影曝光系统包括相同的
- Patent Title: Imaging optical system and projection exposure system including the same
- Patent Title (中): 成像光学系统和投影曝光系统包括相同的
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Application No.: US12767627Application Date: 2010-04-26
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Publication No.: US08605255B2Publication Date: 2013-12-10
- Inventor: Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
- Applicant: Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007051671 20071026
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/32

Abstract:
An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
Public/Granted literature
- US20100265481A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION Public/Granted day:2010-10-21
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