发明授权
- 专利标题： Manufacturing method for array substrate with fringe field switching type thin film transistor liquid crystal display
- 专利标题（中）： 具有条纹场开关型薄膜晶体管液晶显示器的阵列基板的制造方法
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申请号： US13499353申请日： 2011-04-26
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公开(公告)号： US08609477B2公开(公告)日： 2013-12-17
- 发明人: Youngsuk Song , Seungjin Choi , Seongyeol Yoo
- 申请人： Youngsuk Song , Seungjin Choi , Seongyeol Yoo
- 申请人地址： CN Beijing
- 专利权人： Beijing Boe Optoelectronics Technology Co., Ltd.
- 当前专利权人： Beijing Boe Optoelectronics Technology Co., Ltd.
- 当前专利权人地址： CN Beijing
- 代理机构： Ladas & Parry LLP
- 优先权： CN201010159005 20100426
- 国际申请： PCT/CN2011/073336 WO 20110426
- 国际公布： WO2011/134390 WO 20111103
- 主分类号： H01L21/84
- IPC分类号： H01L21/84
摘要：
A manufacturing method for an array substrate with a fringe field switching (FFS) type thin film transistor (TFT) liquid crystal display (LCD) includes the following steps. A pattern of a gate line (1), a gate electrode, a common electrode (6) and a common electrode line (5) is formed by patterning a first transparent conductive film and a first metal film formed successively on a transparent substrate. Contact holes of the gate line in the pad area and a semiconductor pattern are formed through a patterning process after a gate insulator film, and a semiconductor film and a doped semiconductor film are formed successively. A second metal film is deposited and patterned. A second transparent conductive film is deposited and a lift-off process is performed. And then, a pattern of a source electrode, a drain electrode, a TFT channel and a pixel electrode (4) is formed by etching the exposed second metal film and the doped semiconductor film.
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