发明授权
US08614493B2 Photosensor element, photosensor circuit, thin film transistor substrate, display panel, and method for manufacturing photosensor element
有权
光传感器元件,光电传感器电路,薄膜晶体管基板,显示面板及光电传感器元件的制造方法
- 专利标题: Photosensor element, photosensor circuit, thin film transistor substrate, display panel, and method for manufacturing photosensor element
- 专利标题(中): 光传感器元件,光电传感器电路,薄膜晶体管基板,显示面板及光电传感器元件的制造方法
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申请号: US13518564申请日: 2010-11-11
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公开(公告)号: US08614493B2公开(公告)日: 2013-12-24
- 发明人: Masao Moriguchi , Yohsuke Kanzaki , Tsuyoshi Inoue
- 申请人: Masao Moriguchi , Yohsuke Kanzaki , Tsuyoshi Inoue
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 代理机构: Chen Yoshimura LLP
- 优先权: JP2009-295809 20091225
- 国际申请: PCT/JP2010/006633 WO 20101111
- 国际公布: WO2011/077629 WO 20110630
- 主分类号: H01L27/14
- IPC分类号: H01L27/14 ; H01L21/00
摘要:
A photosensor element is provided with a gate electrode disposed on an insulating substrate, a gate insulating film disposed so as to cover the gate electrode, a semiconductor layer disposed on the gate insulating film so as to overlap the gate electrode, and a source electrode and a drain electrode provided on the semiconductor layer so as to overlap the gate electrode and so as to face each other. The photosensor element has the semiconductor layer provided with an intrinsic semiconductor layer in which a channel region is defined and an extrinsic semiconductor layer that is laminated on the intrinsic semiconductor layer such that the channel region is exposed. The extrinsic semiconductor layer protrudes from the drain electrode on the side close to the channel region.
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