发明授权
- 专利标题: Method for performing pattern decomposition based on feature pitch
- 专利标题(中): 基于特征间距进行图案分解的方法
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申请号: US13170126申请日: 2011-06-27
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公开(公告)号: US08615126B2公开(公告)日: 2013-12-24
- 发明人: Jung Chul Park
- 申请人: Jung Chul Park
- 申请人地址: NL Veldhoven
- 专利权人: ASML Masktools B.V.
- 当前专利权人: ASML Masktools B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
The present invention discloses a method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, the features having a plurality of patterns within a minimum pitch for processes utilized to image the target pattern. The method includes superposing a predefined kernel over a pixel, and moving the kernel from one pixel to another, the pixels representing the sub-patterns of the target pattern. Polarity of the kernel may be reversed when the pixel has a stored intensity value that is negative.
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