Invention Grant
US08617775B2 Optimized mask design for fabricating periodic and quasi-periodic patterns 有权
用于制造周期性和准周期性图案的优化掩模设计

  • Patent Title: Optimized mask design for fabricating periodic and quasi-periodic patterns
  • Patent Title (中): 用于制造周期性和准周期性图案的优化掩模设计
  • Application No.: US13509642
    Application Date: 2010-09-14
  • Publication No.: US08617775B2
    Publication Date: 2013-12-31
  • Inventor: Harun Solak
  • Applicant: Harun Solak
  • Applicant Address: CH Villigen
  • Assignee: Eulitha AG
  • Current Assignee: Eulitha AG
  • Current Assignee Address: CH Villigen
  • Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
  • Priority: EP09014217 20091113
  • International Application: PCT/EP2010/063431 WO 20100914
  • International Announcement: WO2011/057835 WO 20110519
  • Main IPC: G03F7/20
  • IPC: G03F7/20 G03F1/00 G03F1/26
Optimized mask design for fabricating periodic and quasi-periodic patterns
Abstract:
A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.
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