Invention Grant
US08618970B2 DA conversion device and electron beam exposure system using the same
有权
DA转换装置和使用其的电子束曝光系统
- Patent Title: DA conversion device and electron beam exposure system using the same
- Patent Title (中): DA转换装置和使用其的电子束曝光系统
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Application No.: US13682311Application Date: 2012-11-20
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Publication No.: US08618970B2Publication Date: 2013-12-31
- Inventor: Takamasa Sato , Ryozo Yoshino , Atsushi Higashino
- Applicant: Advantest Corporation , Hitachi Information & Communication Engineering, Ltd.
- Applicant Address: JP Tokyo JP Kanagawa
- Assignee: Advantest Corp.,Hitachi Information & Teleommunication Engineering, Ltd.
- Current Assignee: Advantest Corp.,Hitachi Information & Teleommunication Engineering, Ltd.
- Current Assignee Address: JP Tokyo JP Kanagawa
- Agency: Muramatsu & Associates
- Priority: JP2012-091762 20120413
- Main IPC: H03M1/66
- IPC: H03M1/66 ; H03K19/0175
Abstract:
A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.
Public/Granted literature
- US20130270449A1 DA CONVERSION DEVICE AND ELECTRON BEAM EXPOSURE SYSTEM USING THE SAME Public/Granted day:2013-10-17
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