发明授权
- 专利标题： Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television
- 专利标题（中）： 具有膜图案的基板及其制造方法，半导体装置，液晶电视和电视机的制造方法
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申请号： US13612146申请日： 2012-09-12
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公开(公告)号： US08624252B2公开(公告)日： 2014-01-07
- 发明人: Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
- 申请人： Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
- 申请人地址： JP Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Kanagawa-ken
- 代理机构： Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权： JP2004-009232 20040116; JP2004-134898 20040428
- 主分类号： H01L29/04
- IPC分类号： H01L29/04 ; H01L29/10 ; H01L31/00 ; H01L27/14 ; H01L29/15 ; H01L31/036 ; H01L27/12
摘要：
The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
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