发明授权
- 专利标题: Nitride semiconductor device
- 专利标题(中): 氮化物半导体器件
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申请号: US13220005申请日: 2011-08-29
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公开(公告)号: US08624261B2公开(公告)日: 2014-01-07
- 发明人: Kentaro Ikeda
- 申请人: Kentaro Ikeda
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2011-53604 20110310
- 主分类号: H01L31/0256
- IPC分类号: H01L31/0256
摘要:
According to one embodiment, a nitride semiconductor device includes a first, a second, a third and a fourth transistor of n-type channel and a resistor. The first transistor has a first gate, a first source, and a first drain. The second transistor has a second gate, a second source electrically connected to the first gate, and a second drain. The third transistor has a third gate, a third source electrically connected to the first source, and a third drain electrically connected to the first gate and the second source. The fourth transistor has a fourth gate electrically connected to the third gate, a fourth source electrically connected to the first source and the third source, and a fourth drain electrically connected to the second gate. The resistor has one end electrically connected to the second drain and one other end electrically connected to the second gate and the fourth drain.
公开/授权文献
- US20120228625A1 NITRIDE SEMICONDUCTOR DEVICE 公开/授权日:2012-09-13
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