Invention Grant
- Patent Title: Method of determining an overlap distance of an optical head and digital exposure device using the method
- Patent Title (中): 使用该方法确定光学头和数字曝光装置的重叠距离的方法
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Application No.: US12902745Application Date: 2010-10-12
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Publication No.: US08625109B2Publication Date: 2014-01-07
- Inventor: Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
- Applicant: Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
- Applicant Address: TW Yongin
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: TW Yongin
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2010-0014430 20100218
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G03B27/32 ; G03F9/00 ; G03C5/00

Abstract:
An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.
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