发明授权
- 专利标题： Projection objective for microlithography
- 专利标题（中）： 微光刻的投影目标
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申请号： US12884670申请日： 2010-09-17
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公开(公告)号： US08629972B2公开(公告)日： 2014-01-14
- 发明人: Johannes Zellner , Hans-Juergen Mann , Martin Endres
- 申请人： Johannes Zellner , Hans-Juergen Mann , Martin Endres
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 优先权： DE102008000800 20080320; DE102008033342 20080716
- 主分类号： G02B5/10
- IPC分类号： G02B5/10 ; G03B27/32 ; G03B27/42 ; G03B27/54
摘要：
A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.
公开/授权文献
- US20110026003A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 公开/授权日：2011-02-03
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