发明授权
- 专利标题: Lithographic printing plate support and presensitized plate
- 专利标题(中): 平版印刷版支持和预感板
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申请号: US13187816申请日: 2011-07-21
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公开(公告)号: US08632949B2公开(公告)日: 2014-01-21
- 发明人: Yusuke Namba , Keio Okano , Shinya Kurokawa , Hirokazu Sawada , Akio Uesugi
- 申请人: Yusuke Namba , Keio Okano , Shinya Kurokawa , Hirokazu Sawada , Akio Uesugi
- 申请人地址: JP Tokyo
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2010-165784 20100723; JP2011-039812 20110225; JP2011-148202 20110704
- 主分类号: B41M5/00
- IPC分类号: B41M5/00 ; B41N1/00 ; G03C1/00 ; G03F7/00
摘要:
A presensitized plate bringing about the lithographic printing plate which exhibits a high resistance to scumming and in which formation of bulges causing image dropouts is suppressed is provided with the lithographic printing plate support which includes an aluminum plate and an anodized film of aluminum provided on the aluminum plate, and has a micropore extending in the anodized film in the direction of depth from a film surface opposite with a film surface facing the aluminum plate. The micropore is sealed at least partially on its inside with protrusions made of boehmite, and the protrusions made of boehmite which are located on the anodized film have a mean height of less than 15 nm.
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