发明授权
- 专利标题： Electro chemical deposition systems and methods of manufacturing using the same
- 专利标题（中）： 电化学沉积系统及使用其的制造方法
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申请号： US13452298申请日： 2012-04-20
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公开(公告)号： US08636879B2公开(公告)日： 2014-01-28
- 发明人: Moosung Chae , Bum Ki Moon , Sunoo Kim , Danny Pak-Chum Shum
- 申请人： Moosung Chae , Bum Ki Moon , Sunoo Kim , Danny Pak-Chum Shum
- 申请人地址： DE Neubiberg
- 专利权人： Infineon Technologies AG
- 当前专利权人： Infineon Technologies AG
- 当前专利权人地址： DE Neubiberg
- 代理机构： Slater & Matsil, L.L.P.
- 主分类号： C25D21/12
- IPC分类号： C25D21/12 ; C25D17/00
摘要：
An electro chemical deposition system is described for forming a feature on a semiconductor wafer. The electro chemical deposition is performed by powering electrodes that includes a cathode, an anode and a plurality of electrically independent auxiliary electrodes.