发明授权
US08637623B2 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition
有权
具有吸电子取代基和内酯骨架的单体,聚合物和光致抗蚀剂组合物
- 专利标题: Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition
- 专利标题(中): 具有吸电子取代基和内酯骨架的单体,聚合物和光致抗蚀剂组合物
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申请号: US12863924申请日: 2009-02-03
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公开(公告)号: US08637623B2公开(公告)日: 2014-01-28
- 发明人: Hiroshi Koyama , Kyuhei Kitao , Akira Eguchi
- 申请人: Hiroshi Koyama , Kyuhei Kitao , Akira Eguchi
- 申请人地址: JP Osaka
- 专利权人: Daicel Chemical Industries, Ltd.
- 当前专利权人: Daicel Chemical Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2008-043501 20080225
- 国际申请: PCT/JP2009/000402 WO 20090203
- 国际公布: WO2009/107327 WO 20090903
- 主分类号: C08F20/10
- IPC分类号: C08F20/10 ; C08F20/22 ; C08F20/26 ; C08F20/34 ; C07D317/06 ; C07C69/01 ; C07C69/013 ; G03F7/004 ; G03F7/26
摘要:
Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; “A” represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.
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