发明授权
- 专利标题： Method for fabricating patterned polyimide film and applications thereof
- 专利标题（中）： 图案化聚酰亚胺膜的制造方法及其应用
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申请号： US13517804申请日： 2012-06-14
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公开(公告)号： US08642485B2公开(公告)日： 2014-02-04
- 发明人: Chin-Yi Lin
- 申请人： Chin-Yi Lin
- 申请人地址： TW Hsinchu
- 专利权人： United Microelectronics Corporation
- 当前专利权人： United Microelectronics Corporation
- 当前专利权人地址： TW Hsinchu
- 代理机构： WPAT, PC
- 代理商 Justin King
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
A method for fabricating a patterned polyimide film, wherein the method comprises steps as follows: Firstly, a polyimide film is provided on a substrate. A wet planarization process is then performed to remove a portion of the polyimide film. Subsequently the planarized polyimide film is patterned.
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