发明授权
- 专利标题: Low thermal stress birefringence imaging lens
- 专利标题(中): 低热应力双折射成像透镜
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申请号: US12784520申请日: 2010-05-21
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公开(公告)号: US08649094B2公开(公告)日: 2014-02-11
- 发明人: Andrew F. Kurtz , Joseph R. Bietry , Barry D. Silverstein
- 申请人: Andrew F. Kurtz , Joseph R. Bietry , Barry D. Silverstein
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 Kevin E. Spaulding
- 主分类号: G02B5/30
- IPC分类号: G02B5/30 ; G02B27/28 ; G02B3/00 ; G02B9/00
摘要:
An imaging lens having reduced susceptibility to thermally-induced stress birefringence for imaging an object plane to an image plane; comprising: an aperture stop positioned between the object plane and the image plane; a first group of lens elements located on the object plane side of the aperture stop; and a second group of lens elements located on the image plane side of the aperture stop; wherein the lens elements immediately adjacent to the aperture stop are fabricated using glasses having a negligible susceptibility to thermal stress birefringence as characterized by a thermal stress birefringence metric; and wherein the other lens elements in the first or second groups of lens elements are fabricated using glasses having at most a moderate susceptibility to thermal stress birefringence as characterized by the thermal stress birefringence metric.
公开/授权文献
- US20110292505A1 LOW THERMAL STRESS BIREFRINGENCE IMAGING LENS 公开/授权日:2011-12-01
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