Invention Grant
- Patent Title: Side gas injector for plasma reaction chamber
- Patent Title (中): 用于等离子体反应室的侧气体喷射器
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Application No.: US12871109Application Date: 2010-08-30
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Publication No.: US08652296B2Publication Date: 2014-02-18
- Inventor: Minshik Kim , Sungyong Ko , Hwankook Chae , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Applicant: Minshik Kim , Sungyong Ko , Hwankook Chae , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Applicant Address: KR Suwon
- Assignee: DMS Co., Ltd.
- Current Assignee: DMS Co., Ltd.
- Current Assignee Address: KR Suwon
- Agency: IPLA P.A.
- Agent James E. Bame
- Priority: KR10-2009-0093796 20091001
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/306
Abstract:
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.
Public/Granted literature
- US20110079356A1 SIDE GAS INJECTOR FOR PLASMA REACTION CHAMBER Public/Granted day:2011-04-07
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