Invention Grant
US08652393B2 Strain and kinetics control during separation phase of imprint process
有权
压印过程分离阶段的应变和动力学控制
- Patent Title: Strain and kinetics control during separation phase of imprint process
- Patent Title (中): 压印过程分离阶段的应变和动力学控制
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Application No.: US12604517Application Date: 2009-10-23
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Publication No.: US08652393B2Publication Date: 2014-02-18
- Inventor: Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
- Applicant: Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B29C45/76
- IPC: B29C45/76
Abstract:
Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
Public/Granted literature
- US20100102469A1 Strain and Kinetics Control During Separation Phase of Imprint Process Public/Granted day:2010-04-29
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