发明授权
US08653455B2 Charged particle beam device and evaluation method using the charged particle beam device
有权
带电粒子束装置和使用带电粒子束装置的评估方法
- 专利标题: Charged particle beam device and evaluation method using the charged particle beam device
- 专利标题(中): 带电粒子束装置和使用带电粒子束装置的评估方法
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申请号: US13375085申请日: 2010-06-03
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公开(公告)号: US08653455B2公开(公告)日: 2014-02-18
- 发明人: Hiroyuki Kitsunai , Seiichiro Kanno , Masaru Matsushima , Shuichi Nakagawa , Go Miya
- 申请人: Hiroyuki Kitsunai , Seiichiro Kanno , Masaru Matsushima , Shuichi Nakagawa , Go Miya
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2009-134962 20090604
- 国际申请: PCT/JP2010/059421 WO 20100603
- 国际公布: WO2010/140649 WO 20101209
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
The charged particle beam device has a problem that a symmetry of equipotential distribution is disturbed near the outer edge of a specimen, an object being evaluated, causing a charged particle beam to deflect there. An electrode plate installed inside the specimen holding mechanism of electrostatic attraction type is formed of an inner and outer electrode plates arranged concentrically. The outer electrode plate is formed to have an outer diameter larger than that of the specimen. The dimensions of the electrode plates are determined so that an overlapping area of the outer electrode plate and the specimen is substantially equal to an area of the inner electrode plate. The inner electrode plate is impressed with a voltage of a positive polarity with respect to a reference voltage and of an arbitrary magnitude, and the outer electrode is impressed with a voltage of a negative polarity and of an arbitrary magnitude.
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