发明授权
- 专利标题: Vertical semiconductor device
- 专利标题(中): 垂直半导体器件
-
申请号: US12437375申请日: 2009-05-07
-
公开(公告)号: US08653556B2公开(公告)日: 2014-02-18
- 发明人: Franz Josef Niedernostheide , Hans-Joachim Schulze
- 申请人: Franz Josef Niedernostheide , Hans-Joachim Schulze
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 代理机构: Maginot, Moore & Beck
- 优先权: DE102005049506 20051013
- 主分类号: H01L29/739
- IPC分类号: H01L29/739
摘要:
A vertical semiconductor device includes a semiconductor body, and first and second contacts on opposite sides of the semiconductor body. A plurality of regions are formed in the semiconductor body including, in a direction from the first contact to the second contact, a first region of a first conductivity type, a second region of a second conductivity type; and a third region of the first conductivity type. The third region is electrically connected to the second contact. A semiconductor zone of the second conductivity type and increased doping density is arranged in the second region. The semiconductor zone separates a first part of the second region from a second part of the second region. The semiconductor zone has a maximum doping density exceeding about 1016 cm−3 and a thickness along the direction from the first contact to the second contact of less than about 3 μm.
公开/授权文献
- US20090212322A1 Vertical Semiconductor Device 公开/授权日:2009-08-27
信息查询
IPC分类: