发明授权
- 专利标题： Resist fortification for magnetic media patterning
- 专利标题（中）： 磁性介质图案抗蚀强化
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申请号： US13193539申请日： 2011-07-28
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公开(公告)号： US08658242B2公开(公告)日： 2014-02-25
- 发明人: Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
- 申请人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： B05D5/12
- IPC分类号： B05D5/12
摘要：
A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
公开/授权文献
- US20120196155A1 RESIST FORTIFICATION FOR MAGNETIC MEDIA PATTERNING 公开/授权日：2012-08-02