发明授权
US08658451B2 Activating GaN LEDs by laser spike annealing and flash annealing
有权
通过激光尖峰退火和闪光退火激活GaN LED
- 专利标题: Activating GaN LEDs by laser spike annealing and flash annealing
- 专利标题(中): 通过激光尖峰退火和闪光退火激活GaN LED
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申请号: US13136019申请日: 2011-07-20
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公开(公告)号: US08658451B2公开(公告)日: 2014-02-25
- 发明人: Yun Wang , Andrew M. Hawryluk
- 申请人: Yun Wang , Andrew M. Hawryluk
- 申请人地址: US CA San Jose
- 专利权人: Ultratech, Inc.
- 当前专利权人: Ultratech, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Opticus IP Law PLLC
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Methods of performing fast thermal annealing in forming GaN light-emitting diodes (LEDs) are disclosed, as are GaN LEDs formed using fast thermal annealing. An exemplary method includes forming a GaN multilayer structure having a n-GaN layer and a p-GaN layer that sandwich an active layer. The method includes performing fast thermal annealing of the p-GaN layer using either a laser or a flash lamp. The method further includes forming a transparent conducting layer atop the GaN multilayer structure, and adding a p-contact to the transparent conducting layer and a n-contact to the n-GaN layer. The resultant GaN LEDs have enhanced output power, lower turn-on voltage and reduced series resistance.
公开/授权文献
- US20110278587A1 Fast Annealing for GaN LEDs 公开/授权日:2011-11-17
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