发明授权
- 专利标题： Monocrystalline substrate including lattice matching atoms in a near surface region and a monocrystalline layer disposed on the substrate
- 专利标题（中）： 单晶衬底包括近表面区域中的晶格匹配原子和设置在衬底上的单晶层
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申请号： US13610206申请日： 2012-09-11
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公开(公告)号： US08659023B2公开(公告)日： 2014-02-25
- 发明人: Franz Hirler , Hans-Joachim Schulze
- 申请人： Franz Hirler , Hans-Joachim Schulze
- 申请人地址： AT Villach
- 专利权人： Infineon Technologies Austria AG
- 当前专利权人： Infineon Technologies Austria AG
- 当前专利权人地址： AT Villach
- 代理机构： Dicke, Billig & Czaja, PLLC
- 主分类号： H01L31/036
- IPC分类号： H01L31/036
摘要：
A monocrystalline layer having a first lattice constant on a monocrystalline substrate having a second lattice constant at least in a near-surface region, wherein the second lattice constant is different from the first lattice constant. Lattice matching atoms are implanted into the near-surface region. The near-surface region is momentarily melted. A layer is epitaxially deposited on the near-surface region that has solidified in monocrystalline fashion.
公开/授权文献
- US20130001642A1 METHOD INCLUDING PRODUCING A MONOCRYSTALLINE LAYER 公开/授权日：2013-01-03