Invention Grant
- Patent Title: N-type organic thin film transistor, ambipolar field-effect transistor, and method of fabricating the same
- Patent Title (中): N型有机薄膜晶体管,双极场效应晶体管及其制造方法
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Application No.: US13425284Application Date: 2012-03-20
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Publication No.: US08664648B2Publication Date: 2014-03-04
- Inventor: Jenn-Chang Hwang , Li-Shiuan Tsai , Chun-Yi Lee , Cheng-Lun Tsai
- Applicant: Jenn-Chang Hwang , Li-Shiuan Tsai , Chun-Yi Lee , Cheng-Lun Tsai
- Applicant Address: TW Hsinchu
- Assignee: National Tsing Hua University
- Current Assignee: National Tsing Hua University
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW100146057A 20111213
- Main IPC: H01L35/24
- IPC: H01L35/24

Abstract:
An N-type organic thin film transistor, an ambipolar field-effect transistor, and methods of fabricating the same are disclosed. The N-type organic thin film transistor of the present invention comprises: a substrate; a gate electrode locating on the substrate; a gate-insulating layer covering the gate electrode, and the gate-insulating layer is made of silk protein; a buffering layer locating on the gate-insulating layer, and the buffering layer is made of pentacene; an N-type organic semiconductor layer locating on the buffering layer; and a source and a drain electrode, wherein the N-type organic semiconductor layer, the buffering layer, the source and the drain electrode are disposed over the gate dielectric layer.
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