发明授权
- 专利标题: Method for automated determination of an optimally parameterized scatterometry model
- 专利标题(中): 自动确定最佳参数化散射测量模型的方法
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申请号: US12841932申请日: 2010-07-22
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公开(公告)号: US08666703B2公开(公告)日: 2014-03-04
- 发明人: Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
- 申请人: Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
- 申请人地址: JP Tokyo US CA Milpitas
- 专利权人: Tokyo Electron Limited,KLA-Tencor Corporation
- 当前专利权人: Tokyo Electron Limited,KLA-Tencor Corporation
- 当前专利权人地址: JP Tokyo US CA Milpitas
- 代理机构: Blakely Sokoloff Taylor & Zafman LLP
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G06F17/10 ; G06G7/48 ; H03F1/26 ; G06F19/00
摘要:
Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.
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