Invention Grant
- Patent Title: Hot tile sputtering system
- Patent Title (中): 热瓦片溅射系统
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Application No.: US12754951Application Date: 2010-04-06
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Publication No.: US08673122B2Publication Date: 2014-03-18
- Inventor: Ian A. McCabe , Jeffrey D. Harlow
- Applicant: Ian A. McCabe , Jeffrey D. Harlow
- Applicant Address: US MI Holland
- Assignee: Magna Mirrors of America, Inc.
- Current Assignee: Magna Mirrors of America, Inc.
- Current Assignee Address: US MI Holland
- Agency: Gardner, Linn, Burkhart & Flory, LLP
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
A system and method for sputtering a coating onto a glass substrate in a vacuum deposition chamber includes providing a backing plate with a separating element disposed at the backing plate. At least one target element or tile is disposed on a surface of the separating element, wherein an expansion gap is provided to allow for expansion of the target relative to the separating element during the sputtering process. The method includes sputtering material from the target and heating the target to a substantially elevated temperature during the sputtering process. The separating element may be a sheet having a low-coefficient of friction surface, and the target may be disposed on the low-coefficient of friction surface of the separating element. The separating element may thermally insulate the target from the backing plate, whereby the target may be heated to a substantially greater temperature than the backing plate during the sputtering process.
Public/Granted literature
- US20100252418A1 HOT TILE SPUTTERING SYSTEM Public/Granted day:2010-10-07
Information query
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