发明授权
- 专利标题： Method for producing silicon fine particles and method for controlling particle diameter of silicon fine particles
- 专利标题（中）： 硅微粒的制造方法和硅微粒的粒径的控制方法
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申请号： US13821603申请日： 2011-09-09
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公开(公告)号： US08673168B2公开(公告)日： 2014-03-18
- 发明人: Seiichi Sato , Mari Miyano , Shigeki Endo , Osamu Shiino , Shingo Ono , Masato Yoshikawa
- 申请人： Seiichi Sato , Mari Miyano , Shigeki Endo , Osamu Shiino , Shingo Ono , Masato Yoshikawa
- 申请人地址： JP Tokyo
- 专利权人： Bridgestone Corporation
- 当前专利权人： Bridgestone Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2010-203528 20100910
- 国际申请： PCT/JP2011/070636 WO 20110909
- 国际公布： WO2012/033203 WO 20120315
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00
摘要：
An object and project of the present invention is to provide a method for producing silicon fine particles and a method for controlling a particle diameter of silicon fine particles which enable efficient production of silicon fine particles having a uniform particle diameter. A the characteristics of the present invention is producing silicon fine particles having a smaller particle diameter than silicon particles and controlling a particle diameter of silicon fine particles by immersing the silicon particles into an etching solution and irradiating the silicon particles immersed in the etching solution with light having a larger energy than a band gap energy of the silicon particles.
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