Invention Grant
- Patent Title: Method for forming fine pattern of polymer thin film
- Patent Title (中): 形成聚合物薄膜精细图案的方法
-
Application No.: US12542188Application Date: 2009-08-17
-
Publication No.: US08673403B2Publication Date: 2014-03-18
- Inventor: Seong Hyun Kim , Sang Chul Lim , Yong Suk Yang , Zin Sig Kim , Doo Hyeb Youn
- Applicant: Seong Hyun Kim , Sang Chul Lim , Yong Suk Yang , Zin Sig Kim , Doo Hyeb Youn
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2008-0130132 20081219
- Main IPC: B05D1/04
- IPC: B05D1/04 ; B05D1/36 ; B05D1/40
Abstract:
Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.
Public/Granted literature
- US20100159139A1 METHOD FOR FORMING FINE PATTERN OF POLYMER THIN FILM Public/Granted day:2010-06-24
Information query
