发明授权
- 专利标题： Method for forming fine pattern of polymer thin film
- 专利标题（中）： 形成聚合物薄膜精细图案的方法
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申请号： US12542188申请日： 2009-08-17
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公开(公告)号： US08673403B2公开(公告)日： 2014-03-18
- 发明人: Seong Hyun Kim , Sang Chul Lim , Yong Suk Yang , Zin Sig Kim , Doo Hyeb Youn
- 申请人： Seong Hyun Kim , Sang Chul Lim , Yong Suk Yang , Zin Sig Kim , Doo Hyeb Youn
- 申请人地址： KR Daejeon
- 专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人地址： KR Daejeon
- 代理机构： Rabin & Berdo, P.C.
- 优先权： KR10-2008-0130132 20081219
- 主分类号： B05D1/04
- IPC分类号： B05D1/04 ; B05D1/36 ; B05D1/40
摘要：
Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.
公开/授权文献
- US20100159139A1 METHOD FOR FORMING FINE PATTERN OF POLYMER THIN FILM 公开/授权日：2010-06-24