Invention Grant
- Patent Title: Formation method of coating
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Application No.: US13204208Application Date: 2011-08-05
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Publication No.: US08673409B2Publication Date: 2014-03-18
- Inventor: Junji Ando , Tomoo Suzuki , Tomoki Ogawa , Masahiro Suzuki , Kazuyoshi Yamakawa , Toshiya Kubo , Hiroyuki Hashitomi , Daigo Yamamoto
- Applicant: Junji Ando , Tomoo Suzuki , Tomoki Ogawa , Masahiro Suzuki , Kazuyoshi Yamakawa , Toshiya Kubo , Hiroyuki Hashitomi , Daigo Yamamoto
- Applicant Address: JP Osaka-shi JP Kariya
- Assignee: JTEKT Corporation,CNK Co., Ltd.
- Current Assignee: JTEKT Corporation,CNK Co., Ltd.
- Current Assignee Address: JP Osaka-shi JP Kariya
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-177138 20100806
- Main IPC: C23C16/32
- IPC: C23C16/32 ; H05H1/24

Abstract:
A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.
Public/Granted literature
- US08734913B2 Formation method of coating Public/Granted day:2014-05-27
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