Disclosed herein is a novel charging controlled RRAM (Resistance Random Access Memory), and various methods of making such a charging controlled RRAM device. In one example, a device disclosed herein includes a first word line structure formed above a substrate, wherein the first word line structure includes a gate electrode and a nano-crystal containing layer of insulating material, a second word line structure formed above the substrate, wherein the second word line structure comprises a gate electrode and a nano-crystal containing layer of insulating material, a first implant region formed in the substrate proximate the first word line structure, wherein the first implant region defines a first bit line, and a second implant region formed in the substrate proximate the second word line structure, wherein the second implant region defines a second bit line.