发明授权
- 专利标题: MEMS element
- 专利标题(中): MEMS元件
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申请号: US13321116申请日: 2010-05-26
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公开(公告)号: US08679355B2公开(公告)日: 2014-03-25
- 发明人: Hauke Pohlmann , Ronald Dekker , Joerg Mueller , Martin Duemling
- 申请人: Hauke Pohlmann , Ronald Dekker , Joerg Mueller , Martin Duemling
- 申请人地址: NL Eindhoven
- 专利权人: NXP, B.V.
- 当前专利权人: NXP, B.V.
- 当前专利权人地址: NL Eindhoven
- 优先权: EP09161293 20090527
- 国际申请: PCT/IB2010/052348 WO 20100526
- 国际公布: WO2010/136986 WO 20101202
- 主分类号: C23F1/00
- IPC分类号: C23F1/00
摘要:
A method of manufacturing an electronic device that comprises a microelectromechanical (MEMS) element, the method comprising the steps of: providing a material layer (34) on a first side of a substrate (32); providing a trench (40) in the material later (34); etching material from the trench (40) such as to also etch the substrate (32) from the first side of the substrate (32); grinding the substrate (32) from a second side of the substrate to expose the trench (40); and using the exposed trench (40) as an etch hole. The exposed trench (40) is used as an etch hole for releasing a portion of the material layer (34), for example a beam resonator (12), from the substrate (32). An input electrode (6), an output electrode (8), and a top electrode (10) are provided.
公开/授权文献
- US20120122314A1 MEMS ELEMENT 公开/授权日:2012-05-17