发明授权
- 专利标题： Patterning process for small devices
- 专利标题（中）： 小型设备的图案化处理
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申请号： US13009758申请日： 2011-01-19
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公开(公告)号： US08679733B2公开(公告)日： 2014-03-25
- 发明人: Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo
- 申请人： Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Zilka-Kotab, PC
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive process on the developed photoresist and the substrate for creating the target surface shape on the substrate. A method according to another embodiment includes applying a photoresist to a substrate; patterning the photoresist using a machine-readable profile; and performing a subtractive process to transfer the profile onto the substrate.
公开/授权文献
- US20120183907A1 PATTERNING PROCESS FOR SMALL DEVICES 公开/授权日：2012-07-19
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