发明授权
- 专利标题： Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
- 专利标题（中）： 舞台装置和坐标校正方法相同，曝光装置和装置制造方法
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申请号： US11584672申请日： 2006-10-23
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公开(公告)号： US08681314B2公开(公告)日： 2014-03-25
- 发明人: Akimitsu Ebihara , Masato Takahashi
- 申请人： Akimitsu Ebihara , Masato Takahashi
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2005-308326 20051024
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/58 ; G03F7/20
摘要：
A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.
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