发明授权
- 专利标题： Measurement system, method and lithographic apparatus
- 专利标题（中）： 测量系统，方法和光刻设备
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申请号： US13116934申请日： 2011-05-26
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公开(公告)号： US08681316B2公开(公告)日： 2014-03-25
- 发明人: Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
- 申请人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G01C9/00
- IPC分类号： G01C9/00 ; G03B27/32 ; G03B27/42 ; H02K41/02
摘要：
A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.
公开/授权文献
- US20110317142A1 MEASUREMENT SYSTEM, METHOD AND LITOGRAPHIC APPARATUS 公开/授权日：2011-12-29