发明授权
- 专利标题: Magnetic tunnel junction (MTJ) on planarized electrode
- 专利标题(中): 平面化电极上的磁隧道结(MTJ)
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申请号: US12777529申请日: 2010-05-11
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公开(公告)号: US08681536B2公开(公告)日: 2014-03-25
- 发明人: Seung H. Kang , Xia Li , Wei-Chuan Chen , Kangho Lee , Xiaochun Zhu , Wah Nam Hsu
- 申请人: Seung H. Kang , Xia Li , Wei-Chuan Chen , Kangho Lee , Xiaochun Zhu , Wah Nam Hsu
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM Incorporated
- 当前专利权人: QUALCOMM Incorporated
- 当前专利权人地址: US CA San Diego
- 代理商 Sam Talpalatsky; Nicholas J. Pauley; Joseph Agusta
- 主分类号: G11C11/22
- IPC分类号: G11C11/22
摘要:
A magnetic tunnel junction (MTJ) with direct contact is manufactured having lower resistances, improved yield, and simpler fabrication. The lower resistances improve both read and write processes in the MTJ. The MTJ layers are deposited on a bottom electrode aligned with the bottom metal. An etch stop layer may be deposited adjacent to the bottom metal to prevent overetch of an insulator surrounding the bottom metal. The bottom electrode is planarized before deposition of the MTJ layers to provide a substantially flat surface. Additionally, an underlayer may be deposited on the bottom electrode before the MTJ layers to promote desired characteristics of the MTJ.
公开/授权文献
- US20110175181A1 Magnetic Tunnel Junction (MTJ) on Planarized Electrode 公开/授权日:2011-07-21
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