Invention Grant
- Patent Title: Method of fabricating cliche
- Patent Title (中): 制造陈词滥调的方法
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Application No.: US13555316Application Date: 2012-07-23
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Publication No.: US08685263B2Publication Date: 2014-04-01
- Inventor: Jun-Hee Lee , Jeong-Hoon Lee
- Applicant: Jun-Hee Lee , Jeong-Hoon Lee
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2011-0077190 20110803
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
Disclosed herein is a method of fabricating a cliché capable of preventing a printing roller from touching a bottom surface of the cliché. The method of fabricating the cliché includes forming a mask thin film pattern having a multilayer structure and a photoresist pattern on a base substrate, forming a resistant reinforcement inducing layer to cover the photoresist pattern, thereby transforming the photoresist pattern into a resistant reinforced photoresist pattern, and forming groove patterns having different depths from each other by etching the base substrate using the resistant reinforced photoresist pattern and the mask thin film pattern having the multilayer structure as masks.
Public/Granted literature
- US20130032569A1 Method of Fabricating Cliche Public/Granted day:2013-02-07
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