发明授权
US08686098B2 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method
有权
含氟化合物，含氟高分子化合物，抗蚀剂组合物，面漆组合物和图案形成方法
- 专利标题： Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method
- 专利标题（中）： 含氟化合物，含氟高分子化合物，抗蚀剂组合物，面漆组合物和图案形成方法
-
申请号： US13375026申请日： 2010-05-20
-
公开(公告)号： US08686098B2公开(公告)日： 2014-04-01
- 发明人: Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
- 申请人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 代理机构： Crowell & Moring LLP
- 优先权： JP2009-131919 20090601
- 国际申请： PCT/JP2010/058540 WO 20100520
- 国际公布： WO2010/140483 WO 20100912
- 主分类号： C08F12/20
- IPC分类号： C08F12/20 ; C08F216/12 ; C07C69/34 ; G03F7/004 ; G03F7/40
摘要：
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
公开/授权文献
信息查询
IPC分类:
