Invention Grant
- Patent Title: MEMS element and method of manufacturing the same
- Patent Title (中): MEMS元件及其制造方法
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Application No.: US12704836Application Date: 2010-02-12
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Publication No.: US08686816B2Publication Date: 2014-04-01
- Inventor: Tomohiro Saito
- Applicant: Tomohiro Saito
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-041382 20090224
- Main IPC: H01H51/22
- IPC: H01H51/22

Abstract:
A MEMS element of an aspect of the present invention including a first electrode provided on a substrate, a second electrode which is provided above the first electrode and which is driven toward the first electrode, an anchor provided on the substrate, a beam which supports the second electrode in midair, one end of the beam being connected to the anchor and the beam including a sidewall part provided at its end in the width direction, the sidewall part having a downward-facing protrusion.
Public/Granted literature
- US20100213039A1 MEMS ELEMENT AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-08-26
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