发明授权
- 专利标题: Method and device for measuring motion error of linear stage
- 专利标题(中): 用于测量线性阶段运动误差的方法和装置
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申请号: US13479933申请日: 2012-05-24
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公开(公告)号: US08687200B2公开(公告)日: 2014-04-01
- 发明人: Sun-Kyu Lee , ChaBum Lee , Gyu Ha Kim
- 申请人: Sun-Kyu Lee , ChaBum Lee , Gyu Ha Kim
- 申请人地址: KR Buk-Gu, Gwangju
- 专利权人: Gwangju Institute of Science and Technology
- 当前专利权人: Gwangju Institute of Science and Technology
- 当前专利权人地址: KR Buk-Gu, Gwangju
- 代理机构: Nath, Goldberg & Meyer
- 代理商 Joshua B. Goldberg
- 优先权: KR10-2011-0056473 20110610
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01N21/86 ; G01V8/00 ; G01D5/36
摘要:
Measurement of motion errors of a linear stage is performed to enable accurate measurement of motion errors in linear directions and a rotational direction in the linear stage using a diffraction grating. A first beam splitter splits a laser beam emitted from a light emitting unit. A first measurement unit measures a unidirectional linear motion error of the linear stage using one laser beam component split by the first beam splitter and a second measurement unit measures an angular motion error and another unidirectional linear motion of the linear stage error using a diffracted beam component obtained by diffracting another laser beam component split by the first beam splitter through the diffraction grating. A third measurement unit circularly polarizes the beam component diffracted through the diffraction grating to measure a third unidirectional linear motion error of the linear stage.