发明授权
- 专利标题： Element with optical marking, manufacturing method, and use
- 专利标题（中）： 具有光学标记，制造方法和使用的元件
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申请号： US12258301申请日： 2008-10-24
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公开(公告)号： US08691369B2公开(公告)日： 2014-04-08
- 发明人: Alexander Schmajew , Hans Krueger , Alois Stelzl
- 申请人： Alexander Schmajew , Hans Krueger , Alois Stelzl
- 申请人地址： DE Munich
- 专利权人： EPCOS AG
- 当前专利权人： EPCOS AG
- 当前专利权人地址： DE Munich
- 代理机构： Slater & Matsil, L.L.P.
- 优先权： DE102006019118 20060425
- 主分类号： B32B7/06
- IPC分类号： B32B7/06
摘要：
A layer combination with a marking is proposed, for example, for a miniaturized electrical component. The layer combination includes a first layer and a different release layer, which is applied on it, on which a pattern is formed by a released pattern-like area. The release area is formed from an inorganic, semiconducting, insulating material, where the pattern produced thereon is machine-readable.
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