发明授权
US08691447B2 Homogeneous, dual layer, solid state, thin film deposition for structural and/or electrochemical characteristics 有权
用于结构和/或电化学特性的均匀,双层,固态,薄膜沉积

Homogeneous, dual layer, solid state, thin film deposition for structural and/or electrochemical characteristics
摘要:
Solid state, thin film, electrochemical devices (10) and methods of making the same are disclosed. An exemplary device 10 includes at least one electrode (14) and an electrolyte (16) deposited on the electrode (14). The electrolyte (16) includes at least two homogenous layers of discrete physical properties. The two homogenous layers comprise a first dense layer (15) and a second porous layer (16).
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