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US08691478B2 Attenuated phase shift mask for multi-patterning 有权
用于多图案化的衰减相移掩模

Attenuated phase shift mask for multi-patterning
Abstract:
An attenuated phase shift mask (AttPSM) is fabricated with a set of fully transmitting regions, some parts adjacent phase-shifting regions with a first reduced transmission and first phase shift near 180 degrees, and remaining parts adjacent phase-shifting regions with a second transmission higher than the first transmission and second phase shift lower than the first phase shift.
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