Invention Grant
US08691492B2 Silane-based compounds and photosensitive resin composition comprising the same
有权
硅烷系化合物及含有它们的感光性树脂组合物
- Patent Title: Silane-based compounds and photosensitive resin composition comprising the same
- Patent Title (中): 硅烷系化合物及含有它们的感光性树脂组合物
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Application No.: US13566434Application Date: 2012-08-03
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Publication No.: US08691492B2Publication Date: 2014-04-08
- Inventor: Changho Cho , Yoon Hee Heo , Sunghyun Kim , Han Soo Kim , Sunhwa Kim , Won Jin Chung
- Applicant: Changho Cho , Yoon Hee Heo , Sunghyun Kim , Han Soo Kim , Sunhwa Kim , Won Jin Chung
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2011-0077769 20110804
- Main IPC: G03C1/00
- IPC: G03C1/00 ; G03F7/00

Abstract:
The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.
Public/Granted literature
- US20130034814A1 SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME Public/Granted day:2013-02-07
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