发明授权
- 专利标题： Method for removing germanium suboxide
- 专利标题（中）： 除去低氧化锗的方法
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申请号： US13590090申请日： 2012-08-20
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公开(公告)号： US08691636B2公开(公告)日： 2014-04-08
- 发明人: Po-Tsun Liu , Chen-Shuo Huang
- 申请人： Po-Tsun Liu , Chen-Shuo Huang
- 申请人地址： TW Hsinchu
- 专利权人： National Chiao Tung University
- 当前专利权人： National Chiao Tung University
- 当前专利权人地址： TW Hsinchu
- 代理机构： DLA Piper LLP (US)
- 优先权： TW101100190A 20120103
- 主分类号： H01L21/335
- IPC分类号： H01L21/335 ; H01L21/8232
摘要：
A method for removing germanium suboxide between a germanium (Ge) substrate and a dielectric layer made of metal oxide includes causing a supercritical fluid composition that includes a supercritical carbon dioxide fluid and an oxidant to diffuse into the germanium suboxide such that metal residues in the dielectric layer, the germanium suboxide and the oxidant are subjected to a redox reaction so as to reduce the germanium suboxide into germanium.
公开/授权文献
- US20130171830A1 METHOD FOR REMOVING GERMANIUM SUBOXIDE 公开/授权日：2013-07-04
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