Invention Grant
- Patent Title: Resonator and production method thereof
- Patent Title (中): 谐振器及其制作方法
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Application No.: US13377898Application Date: 2010-06-30
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Publication No.: US08698257B2Publication Date: 2014-04-15
- Inventor: Tomohide Kamiyama , Tomohiro Iwasaki , Takehiko Yamakawa , Kunihiko Nakamura , Keiji Onishi
- Applicant: Tomohide Kamiyama , Tomohiro Iwasaki , Takehiko Yamakawa , Kunihiko Nakamura , Keiji Onishi
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: JP2009-155292 20090630
- International Application: PCT/JP2010/004321 WO 20100630
- International Announcement: WO2011/001680 WO 20110106
- Main IPC: H01L29/84
- IPC: H01L29/84

Abstract:
A resonator using the MEMS technology is provided which improves the accuracy of a shape of electrodes so as avoid a short circuit that would otherwise be caused between input and output electrodes to thereby increase the reliability thereof. A resonator includes a substrate 101, an insulation layer 102 formed selectively on the substrate 101 as a sacrificial surface, a beam 103 formed on the substrate 101 via a space, a first support portion 104A formed on the insulation layer 102 of the same material as that of the beam 103, and electrodes formed with a space defined between the beam 103 and themselves for signals to be inputted thereinto and outputted therefrom. A sectional area of the beam 103 and a sectional area of the first support portion 104A are substantially equal in a section which is perpendicular to a longitudinal direction of the beam 103.
Public/Granted literature
- US20120091547A1 RESONATOR AND PRODUCTION METHOD THEREOF Public/Granted day:2012-04-19
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