Invention Grant
US08698281B2 Nonvolatile memory devices that use resistance materials and internal electrodes
有权
使用电阻材料和内部电极的非易失性存储器件
- Patent Title: Nonvolatile memory devices that use resistance materials and internal electrodes
- Patent Title (中): 使用电阻材料和内部电极的非易失性存储器件
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Application No.: US13655584Application Date: 2012-10-19
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Publication No.: US08698281B2Publication Date: 2014-04-15
- Inventor: In-Gyu Baek , Hyun-Jun Sim , Jin-Shi Zhao , Eun-Kyung Yim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2008-0023416 20080313
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.
Public/Granted literature
- US20130043453A1 Nonvolatile Memory Devices that Use Resistance Materials and Internal Electrodes Public/Granted day:2013-02-21
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